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Single-wafer cleaning equipment
Device Model: SCS-SQ200
Applicable Process: Cleaning, etching, stripping
Product Size: 6/8/12 inch
Chamber type: Spray/Soak
Chamber Count: 2/4/8pcs（Customizable）
Load/Unload: open cassette/FOUP/SMIF/EFEM
Process Specifications: particle：0.2um≤30ea,... MORE +
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Batch cleaning equipment
Automatic cleaning equipment is widely used in the field of integrated circuit, advanced packaging in the field of photoresist removal process. Compared with the traditional glue-removing equipment, the degree of automation is higher, using modular design, can be based on customer customized process... MORE +
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SRD Cleaning Equipment
Device Model : SCS-SRD200
Applicable Process: Cleaning, etching, stripping
Product Size: 6/8/12 inch（25/50pcs）
Chamber type: Rotary Spraying
Chamber Count: Customizable
Load/Unload ： open cassette
Process Specifications： particle：0.2um≤30ea，Metal ions：≤5E10atoms/c... MORE +
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