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SRD Cleaning Equipment
Device Model : SCS-SRD200
Applicable Process: Cleaning, etching, stripping
Product Size: 6/8/12 inch（25/50pcs）
Chamber type: Rotary Spraying
Chamber Count: Customizable
Load/Unload ： open cassette
Process Specifications： particle：0.2um≤30ea，Metal ions：≤5E10atoms/cm2
Software Support： IPC+PLC
MTBF： ≥720h
Wafer Breakage Rate： ≤1/10000
OEE： ≥95%
Applicable Process: Cleaning, etching, stripping
Product Size: 6/8/12 inch（25/50pcs）
Chamber type: Rotary Spraying
Chamber Count: Customizable
Load/Unload ： open cassette
Process Specifications： particle：0.2um≤30ea，Metal ions：≤5E10atoms/cm2
Software Support： IPC+PLC
MTBF： ≥720h
Wafer Breakage Rate： ≤1/10000
OEE： ≥95%
Features
The SRD equipment mainly achieves efficient cleaning and drying through the use of centrifugal force and surface tension controlRotary rinsing and rotary drying，Reduce cross-contamination.
Application
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